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Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope: Journal of Vacuum Science & Technology B: Vol 31, No 6
Latent and Masked Software Bugs - QATestLab Blog
SEMATECH's EUVL Mask Blank Defect Reduction Program: ML ...
Mask Defect Auto Disposition based on Aerial Image in Mask ...
Residual-type mask defect printability for extreme ultraviolet lithography: Journal of Vacuum Science & Technology B: Vol 30, No 6
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Know Your Stuff: Understanding defect liability period and latent defects | The Edge Markets
Defect-free mask blanks next EUV challenge - Semiconductor Digest
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EUV masks blank defects categorized based on location with possible... | Download Scientific Diagram
Multi-task Defect Prediction | Chao Ni
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Structure and typical defects in an EUV mask | Download Scientific Diagram
EUV multilayer defect characterization via cycle-consistent learning
key parameters contributing to printability of EUV mask defects | Download Scientific Diagram